A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

SHEKARGOFTAR Masoud HOMOLA Tomáš

Year of publication 2020
Type Article in Periodical
Magazine / Source Plasma Chemistry and Plasma Processing
MU Faculty or unit

Faculty of Science

Citation
Web https://doi.org/10.1007/s11090-020-10059-1
Doi http://dx.doi.org/10.1007/s11090-020-10059-1
Keywords Hydrogen plasma; Perovskite; Chemical composition; Plasma-chemical modification; Crystallization
Description This contribution presents a new approach to rapid and low-temperature plasma-chemical crystallization of perovskite films. Chlorine-incorporated perovskite (MAPbI(3-x)Cl(x)) films were exposed to diffuse atmospheric hydrogen (H-2) plasma immediately after their deposition. Several types of surface characterization techniques were used to investigate the effect of the H-2 plasma on the surface of the perovskite films. Since the H-2 plasma was generated at a low temperature (<= 70 degrees C), there was no considerable damage to the plasma-treated perovskite films-although the morphology and chemistry changed significantly. H-2 plasma had a range of effects on the surface of the perovskite films: (1) changes in the chemical composition of the perovskite surface without removal of lead; (2) modification of the optoelectrical band structure; (3) crystallization of the perovskite film; and (4) the grain of the surface became highly ordered. The results presented demonstrate that H-2 plasma is a rapid and low-cost method for the manufacture of crystallized perovskite films. The method may be considered a significant step towards low-temperature, annealing-free crystallization of perovskite films.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.