Nucleation and initial growth of atomic layer deposited titanium oxide determined by spectroscopic ellipsometry and the effect of pretreatment by surface barrier discharge

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Authors

CAMERON David Campbell KRUMPOLEC Richard IVANOVA Tatiana HOMOLA Tomáš ČERNÁK Mirko

Year of publication 2015
Type Article in Periodical
Magazine / Source Applied Surface Science
MU Faculty or unit

Faculty of Science

Citation
Web http://www.sciencedirect.com/science/article/pii/S016943321500731X
Doi http://dx.doi.org/10.1016/j.apsusc.2015.03.135
Field Plasma physics
Keywords Atomic layer deposition; Spectroscopic ellipsometry; Quantum confinement effects; Nucleation density
Description This paper reports on the use of spectroscopic ellipsometry to characterise the initial nucleation stage of the atomic layer deposition of the anatase phase of titanium dioxide on silicon substrates.
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