THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA

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Authors

MEDVECKÁ Veronika ZAHORANOVÁ Anna KOVÁČIK Dušan GREGUŠ Ján

Year of publication 2012
Type Article in Periodical
Magazine / Source CHEMICKÉ LISTY
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords DCSBD; silicon substrates; ITO glass;cleaning; organic contaminants
Description Plasma generated by DCSBD was investigated for cleaning and removing of organic contaminants from semiconductor materials. ITO glass used in photovoltaics and three types of most often used silicon surfaces in semiconductor industry – precleaned silicon, thermally oxidized silicon and H-terminated silicon was studied. The changes in chemical bonds on silicon surfaces were investigated by FTIR. Removing of IPA from silicon substrates was observed by XPS measurements. Effectivity of DCSBD as cleaning agent in comparison with isopropylacohol was investigated on ITO glass samples by XPS measurement.
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